Array substrate, manufacturing method thereof, and display device

ABSTRACT

An array substrate, a manufacturing method thereof, and a display device including the array substrate. The array substrate includes a plurality of gate line groups and a plurality of data lines disposed on a substrate, the plurality of gate line groups intersecting with the plurality of data lines to define a plurality of pixel units arranged in an array, wherein each of the plurality of gate line groups includes a first gate line and a second gate line insulated from each other, and orthographic projections of the first gate line and the second gate line of each of the plurality of gate line groups on the substrate at least partially overlap.

RELATED APPLICATION

The present application claims the benefit of Chinese Patent ApplicationNo. 201710601592.6, filed on Jul. 21, 2017, the entire disclosure ofwhich is incorporated herein by reference.

FIELD

The present disclosure relates to the field of display technologies, andparticularly to an array substrate, a manufacturing method thereof, anda display device.

BACKGROUND

With the continuous development of display technologies, various drivingtechnologies with reduced costs are widely used in display devices. Inparticular, Dual Gate technology has attracted widespread attention as atechnology that can reduce product costs.

In Dual Gate technology, the number of data lines of a display panel isreduced by half, and the number of gate lines is doubled. Accordingly,the number of source driving ICs (Integrated Circuits) connected to thedata lines is reduced by half, and the number of gate driving ICsconnected to the gate lines is doubled. Since the unit price of a gatedriving IC is generally lower than that of a source driving IC, cost isaccordingly reduced.

At present, in Dual Gate technology, the gate lines are arranged inparallel in a same layer, and widths of two parallel gate lines andspacing between them occupy too much area, leading to reduction of theaperture ratio of an array substrate, thereby affecting thetransmittance of the array substrate.

SUMMARY

In view of the above, embodiments of the present disclosure provide animproved array substrate, a manufacturing method thereof, and a displaydevice.

In an aspect of the present disclosure, there is provided an arraysubstrate comprising a plurality of gate line groups and a plurality ofdata lines disposed on a substrate, the plurality of gate line groupsintersecting with the plurality of data lines to define a plurality ofpixel units arranged in an array, wherein each of the plurality of gateline groups includes a first gate line and a second gate line insulatedfrom each other, and orthographic projections of the first gate line andthe second gate line of each of the plurality of gate line groups on thesubstrate at least partially overlap.

According to some embodiments, each row of pixel units includes aplurality of pixel unit groups, each of the plurality of pixel unitgroups includes a first pixel unit and a second pixel unit, and thefirst pixel unit and the second pixel unit of each of the plurality ofpixel unit groups share one data line.

According to some embodiments, in each of the plurality of pixel unitgroups, a thin film transistor of the first pixel unit is connected to afirst gate line in a corresponding gate line group, and a thin filmtransistor of the second pixel unit is connected to a second gate linein the corresponding gate line group.

According to some embodiments, the array substrate further comprises aninsulating film layer disposed between the first gate line and thesecond gate line of each of the plurality of gate line groups, the firstgate line is disposed at a side of the insulating film layer close tothe substrate, the second gate line is disposed at a side of theinsulating film layer away from the substrate, and at a position of thethin film transistor of the first pixel unit, the array substratefurther comprises a first gate connection line disposed in a same layeras the second gate line, the first gate connection line beingelectrically connected to the first gate line.

According to some embodiments, at an intersection of a data line and agate line group, orthographic projections of the first gate line and thesecond gate line in the gate line group on the substrate do not overlap.

According to some embodiments, orthographic projections of the firstgate line and the first gate connection line on the substrate completelyoverlap.

According to some embodiments, in an area of the array substrate otherthan the intersection of the data line and the gate line group,orthographic projections of the first gate line and the second gate lineon the substrate completely overlap.

In another aspect of the present disclosure, there is provided a displaydevice comprising any of the array substrates described above.

In a further aspect of the present disclosure, there is provided amanufacturing method of an array substrate, comprising: forming aplurality of gate line groups and a plurality of data lines on asubstrate, the plurality of gate line groups intersecting with theplurality of data lines to define a plurality of pixel units arranged inan array. Forming each of the plurality of gate line groups comprises:forming a first gate line on the substrate; forming an insulating filmlayer on an exposed portion of the substrate and the first gate line;and forming a second gate line on the insulating film layer.Orthographic projections of the first gate line and the second gate lineon the substrate at least partially overlap.

According to some embodiments, the step of forming a second gate line onthe insulating film layer comprises: forming a via hole in theinsulating film layer; and forming the second gate line and a first gateconnection line in a same layer on the insulating film layer. The firstgate line is electrically connected to the first gate connection linethrough the via hole, and the first gate connection line is located at aposition of a thin film transistor connected to the first gate line.

According to some embodiments, at an intersection of a data line and agate line group, orthographic projections of the first gate line and thesecond gate line in the gate line group on the substrate do not overlap.

According to some embodiments, orthographic projections of the firstgate line and the first gate connection line on the substrate completelyoverlap.

According to some embodiments, in an area of the array substrate otherthan the intersection of the data line and the gate line group,orthographic projections of the first gate line and the second gate lineon the substrate completely overlap.

According to some embodiments, after the step of forming a second gateline on the insulating film layer, the manufacturing method furthercomprises: forming a gate insulating layer, an active layer, a dataline, a drain, a common electrode, a first electrode layer, apassivation layer, and a second electrode layer on the second gate line.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 schematically shows a partial structural diagram of an arraysubstrate provided by embodiments of the present disclosure;

FIG. 2 shows a sectional view of the array substrate according toembodiments of the present disclosure as shown in FIG. 1 taken alongA-A′;

FIG. 3 shows a sectional view of the array substrate according toembodiments of the present disclosure as shown in FIG. 1 taken alongB-B′;

FIG. 4 shows a sectional view of the array substrate according to thepresent disclosure as shown in FIG. 1 taken along C-C′;

FIG. 5 shows a flowchart of a manufacturing method of an array substrateaccording to embodiments of the present disclosure.

DETAILED DESCRIPTION

To make the above objectives, features, and advantages of the presentdisclosure apparent, the present disclosure will be further described indetail below with reference to the accompanying drawings and specificimplementations.

Referring to FIG. 1, a partial structural schematic diagram of an arraysubstrate provided by embodiments of the present disclosure isillustrated.

As shown in FIG. 1, the array substrate comprises a plurality of gateline groups 10 and a plurality of data lines 13 formed on a substrate,and a plurality of pixel units M1, M2, M3 and M4 arranged in an array.Each gate line group 10 includes a first gate line and a second gateline insulated from each other, and orthographic projections of thefirst gate line and the second gate line on the substrate at leastpartially overlap (in particular, as shown in FIG. 1, the orthographicprojections of the first gate line and the second gate line on thesubstrate completely overlap).

In a typical array substrate, width of each gate line group is the sumof widths of two parallel gate lines and spacing between them as viewedfrom a top surface of the array substrate. In contrast, in the arraysubstrate according to embodiments of the present disclosure, bydisposing the first gate line and the second gate line of each gate linegroup 10 such that their orthographic projections on the substrate atleast partially overlap, width of each gate line group 10 is smallerthan the sum of widths of two gate lines as viewed from a top surface ofthe array substrate, and particularly may be just width of one gateline. Therefore, compared to the typical array substrate, the arraysubstrate according to embodiments of the present disclosure caneffectively reduce the area occupied by the gate lines. On this basis,width of at least one gate line in a gate line group can beappropriately increased so as to decrease wire resistance of the gateline and reduce gate delay. As will be appreciated by those skilled inthe art, in this case, it should be ensured that the width of the gateline group is still smaller than the sum of widths of two parallel gatelines and spacing between them, so that the area occupied by the gatelines can be effectively reduced as compared to the typical arraysubstrate.

In FIG. 1, M1, M2, M3 and M4 each represent one pixel unit, referencenumeral 15 denotes a common electrode, reference numeral 14 denotes adrain, and reference numeral 20 denotes an active layer. Since FIG. 1just shows a partial structural schematic diagram of the arraysubstrate, a common electrode 15 on the left side of the pixel unit M1is not shown in FIG. 1, and a common electrode 15 on the right side ofthe pixel unit M4 is not shown in FIG. 1, either. It is to be noted thatM1, M2, M3 or M4 only indicates a position where a pixel unit resides,and does not indicate the area occupied by the pixel unit or thestructure thereof.

A gate line group 10 including a first gate line and a second gate lineis disposed between two adjacent rows of pixel units. As shown in FIG.1, the pixel units M1, M2, M3 and M4 may be pixel units of the M-th row,where M is an integer greater than 1. Pixel units of the (M−1)-th row(not shown in FIG. 1) are located on the other side of a gate line group10 above the pixel units of the M-th row, and pixel units of the(M+1)-th row (not shown in FIG. 1) are located on the other side of agate line group 10 below the pixel units of the M-th row. Each gate linegroup 10 includes a first gate line and a second gate line. That is, afirst gate line and a second gate line are disposed between the pixelunits of the (M−1)-th row and the pixel units of the M-th row, and afirst gate line and a second gate line are also disposed between thepixel units of the M-th row and the pixel units of the (M+1)-th row.

Each row of pixel units includes a plurality of pixel unit groups, eachpixel unit group includes a first pixel unit and a second pixel unit,and the first pixel unit and the second pixel unit in each pixel unitgroup share one data line. As shown in FIG. 1, M1, M2, M3 and M4represent a part of pixel units in the pixel units of the M-th row,wherein the pixel unit M1 and the pixel unit M2 can be regarded as onepixel unit group M12, the pixel unit M3 and pixel unit M4 can beregarded as another pixel unit group M34, and the two pixel unit groupsare arranged adjacent to each other. That is, the pixel unit group M12includes a first pixel unit M1 and a second pixel unit M2, the pixelunit group M34 includes a first pixel unit M3 and a second pixel unitM4, the first pixel unit M1 and the second pixel unit M2 share one dataline 13, and the first pixel unit M3 and the second pixel unit M4 alsoshare one data line 13. A common electrode is disposed between twoadjacent pixel unit groups. Specifically, as shown in FIG. 1, a commonelectrode 15 is disposed between the pixel unit group M12 and the pixelunit group M34.

It is to be noted that, although a row of pixel units including fourpixel units is schematically illustrated in FIG. 1, as will beappreciated by those skilled in the art, this is merely illustrative.Depending on the resolution and the size of the display device, each rowof pixel units may include any number of pixel units and any number ofpixel unit groups, wherein each pixel unit group includes two pixelunits.

In embodiments of the present disclosure, in each pixel unit group, athin film transistor of the first pixel unit is connected to a firstgate line in a corresponding gate line group, and a thin film transistorof the second pixel unit is connected to a second gate line in thecorresponding gate line group. In the embodiment shown in FIG. 1, thethin film transistor of the first pixel unit M1 is connected to thefirst gate line in the gate line group 10 above the pixel unit groupM12, and the thin film transistor of the second pixel unit M2 isconnected to the second gate line in the gate line group 10 above thepixel unit group M12.

A structure of the array substrate according to the present disclosurewill be described below in conjunction with the schematic diagramsshowing states of film layers at respective positions.

Referring to FIG. 2, a sectional view of the array substrate accordingto embodiments of the present disclosure as shown in FIG. 1 taken alongA-A′ is illustrated.

In embodiments of the present disclosure, the sectional view of thearray substrate taken along A-A′ is a schematic diagram showing thestates of the film layers at positions other than the position whereTFTs (Thin Film Transistor) reside. As shown in FIG. 2, a first gateline 11, an insulating film layer 23, and a second gate line 12 aredisposed on a substrate 16, successively, wherein orthographicprojections of the first gate line 11 and the second gate line 12 on thesubstrate 16 at least partially overlap.

In some embodiments, the insulating film layer 23 may be a GI (GateInsulator) film, or may be a PS (polystyrene) film or the like.Alternatively, the insulating film layer 23 may be an organic filmlayer. Thickness of an organic film layer is on the order ofmicrometers, so a thicker organic film layer increases the distancebetween the first gate line 11 and the second gate line 12 as comparedto a GI film or a PS film that is usually on the order of 10⁻⁷ m. Thus,capacitance is reduced, thereby reducing load. For example, the organicfilm layer may be made of a resin material.

Further, a gate insulating layer 19, a first electrode layer 21, apassivation layer 18, and a second electrode layer 22 are disposed on anexposed portion of the insulating film layer 23 and the second gate line12, successively. In an exemplary embodiment, the first electrode layer21 and the second electrode layer 22 may be made of ITO (Indium TinOxide).

Referring to FIG. 3, a sectional view of the array substrate accordingto embodiments of the present disclosure as shown in FIG. 1 taken alongB-B′ is illustrated.

In embodiments of the present disclosure, the sectional view of thearray substrate taken along B-B′ is a schematic diagram showing statesof film layers at positions where TFTs reside. As shown in FIG. 3, afirst gate line 11 and an insulating film layer 23 are disposed on thesubstrate 16, successively. A plurality of via holes 17 are provided atpositions of the insulating film layer 23 corresponding to the firstgate line 11, and a first gate connection line 111 is electricallyconnected to the first gate line 11 through the via hole 17. The arraysubstrate further comprises a second gate line 12 disposed on theinsulating film layer 23, a gate insulating layer 19 disposed on thesecond gate line 12, the first gate connection line 111 and an exposedportion of the insulating film layer 23, an active layer 20 and a firstelectrode layer 21 disposed on the gate insulating layer 19, and a dataline 13 and a drain 14 disposed on an exposed portion of the gateinsulating layer 19 and a portion of the active layer 20. In addition, apassivation layer 18 covers the first electrode layer 21, the drain 14,the active layer 20, and the data line 13, and a second electrode layer22 is disposed on the passivation layer 18. In FIG. 3, the drain 14 andthe active layer 20 on the left side can be regarded as a thin filmtransistor that belongs to a second pixel unit in one pixel unit group,the data line 13 is electrically connected to a source of the thin filmtransistor, and the thin film transistor is controlled by the secondgate line 12. The drain 14 and the active layer 20 on the right side canbe regarded as a thin film transistor that belongs to a first pixel unitin the same pixel group, the data line 13 is electrically connected to asource of the thin film transistor, and the thin film transistor iscontrolled by the first gate line 11 through the first gate connectionline 111. The first electrode layer 21 is electrically connected to acorresponding drain 14 so as to provide a pixel voltage to a pixel unitwhere the drain 14 is located. The second electrode layer 22 serves toprovide a common voltage to the pixel unit. Since being controlled bythe first gate line 11 and the second gate line 12 respectively,different data signals can be written into two thin film transistorswhich are connected to the same data line 13, and it can be ensured thatthe numbers of data lines and expensive source driving integratedcircuits corresponding to the data lines are reduced by half while thearray substrate normally operates.

In conjunction with FIGS. 1 and 3, it can be seen that the orthographicprojections of the first gate line 11 and the second gate line 12 on thesubstrate 16 may not overlap at the position of the TFT.

Specifically, as shown in FIG. 3, the first gate line 11 is disposed ona side of the insulating film layer 23 close to the substrate 16, andthe second gate line 12 is disposed on a side of the insulating filmlayer 23 away from the substrate 16. At the position of the thin filmtransistor of the first pixel unit, the array substrate comprises afirst gate connection line 111 formed in the same layer as the secondgate line 12, and the first gate line 11 is electrically connected tothe first gate connection line 111 through the via hole 17. By makingthe first gate connection line 111 in the same layer as the second gateline 12 and connected to the first gate line 11 through the via hole 17,thickness of the gate insulating layer between the first gate line and acorresponding thin film transistor can be equal to the thickness of thegate insulating layer between the second gate line and a correspondingthin film transistor, so that the two thin film transistors have thesame operating characteristics.

Referring to FIG. 4, a sectional view of the array substrate accordingto the present disclosure as shown in FIG. 1 taken along C-C′ isillustrated.

In embodiments of the present disclosure, the sectional view of thearray substrate along C-C′ is a schematic diagram showing states of thefilm layers at the position of the first gate line. As shown in FIG. 4,a first gate line 11 and an insulating film layer 23 are disposed on thesubstrate 16, successively. A via hole 17 is provided in the insulatingfilm layer 23, and a first gate connection line 111 is electricallyconnected to the first gate line 11 through the via hole 17. Further, agate insulating layer 19, an active layer 20, a data line 13, a commonelectrode 15, a passivation layer 18, and a second electrode layer 22are disposed on the first gate connection line 111 and an exposedportion of the insulating film layer 23, successively. In conjunctionwith FIGS. 2, 3 and 4, it can be seen that the array substrate furthercomprises the gate insulating layer 19, the active layer 20, the dataline 13, the drain 14, the common electrode 15, the first electrodelayer 21, the passivation layer 18, and the second electrode layer 22disposed on the second gate line 12.

In embodiments of the present disclosure, a plurality of gate linegroups and a plurality of data lines are disposed on the substrate, eachgate line group includes a first gate line and a second gate lineinsulated from each other, and orthographic projections of the firstgate line and the second gate line on the substrate at least partiallyoverlap. By arranging the two gate lines in the array substrate in astacked manner, width of each gate line group as viewed from a topsurface of the array substrate can be greatly reduced, therebyeffectively reducing the area occupied by the gate lines, increasing theaperture ratio of the array substrate, and improving the transmittanceof a display device including the array substrate.

Embodiments of the present disclosure further provide a display devicecomprising any of the array substrates described above. The arraysubstrate comprises a plurality of gate line groups and a plurality ofdata lines disposed on the substrate. Each gate line group includes afirst gate line and a second gate line insulated from each other, andorthographic projections of the first gate line and the second gate lineon the substrate at least partially overlap.

In an exemplary embodiment, the first gate line and the second gate linemay be insulated from each other by an insulating film layer disposedtherebetween. In particular, the insulating film layer may be made of aresin material.

In the above display device, one gate line group including a first gateline and a second gate line is disposed between two adjacent rows ofpixel units. Each row of pixel units includes a plurality of pixel unitgroups, wherein each pixel unit group includes a first pixel unit and asecond pixel unit, and the first pixel unit and the second pixel unit ineach pixel unit group share one data line. In each pixel unit group, athin film transistor of the first pixel unit is connected to the firstgate line, and a thin film transistor of the second pixel unit isconnected to the second gate line in the same gate line group. The firstgate line is disposed on a side of the insulating film layer close tothe substrate, and the second gate line is disposed on a side of theinsulating film layer away from the substrate. At position of the thinfilm transistor of the first pixel unit, the array substrate may furthercomprise a first gate connection line disposed in the same layer as thesecond gate line. The first gate connection line is electricallyconnected to the first gate line through a via hole in the insulatingfilm layer.

Further, the array substrate may further comprise a gate insulatinglayer, an active layer, a data line, a drain, a common electrode, afirst electrode layer, a passivation layer, and a second electrode layerdisposed on the second gate line.

In various exemplary embodiments, the display device may be any productor component that has a display function, such as an electronic paper, amobile phone, a tablet computer, a television, a display, a notebookcomputer, a digital photo frame, a navigator, and the like.

In embodiments of the present disclosure, the display device comprisesan array substrate. In the array substrate, a plurality of gate linegroups and a plurality of data lines are disposed on a substrate, eachgate line group includes a first gate line and a second gate lineinsulated from each other, and orthographic projections of the firstgate line and the second gate line on the substrate at least partiallyoverlap. By arranging the two gate lines in the array substrate in astacked manner, width of each gate line group as viewed from a topsurface of the array substrate can be greatly reduced, therebyeffectively reducing the area occupied by the gate lines, increasing theaperture ratio of the array substrate, and improving the transmittanceof the display device.

Referring to FIG. 5, a flowchart of a manufacturing method of an arraysubstrate according to embodiments of the present disclosure isillustrated. As shown in FIG. 5, the manufacturing method may compriseforming a first gate line on a substrate at step 501.

In step 501, in conjunction with FIGS. 2 and 3, the first gate line 11is formed on the substrate 16 by a patterning process. The patterningprocess generally includes steps such as exposure, development, etching,and the like.

Next, at step 502, an insulating film layer is formed on an exposedportion of the substrate and the first gate line.

In step 502, in conjunction with FIGS. 2 and 3, after the first gateline 11 is formed on the substrate 16, the insulating film layer 23 isformed on an exposed portion of the substrate 16 and the first gate line11.

Then, at step 503, a second gate line is formed on the insulating filmlayer such that orthographic projections of the first gate line and thesecond gate line on the substrate at least partially overlap.

In step 503, in conjunction with FIGS. 2 and 3, after the insulatingfilm layer 23 is formed, the second gate line 12 is formed on theinsulating film layer such that orthographic projections of the firstgate line 11 and the second gate line 12 on the substrate 16 at leastpartially overlap, thereby effectively reducing the area occupied by thegate lines.

In an exemplary embodiment, the above manufacturing method may furthercomprise: etching a via hole in the insulating film layer; forming asecond gate line and a first gate connection line on the insulating filmlayer, wherein the first gate line is electrically connected to thefirst gate connection line through the via hole formed in the insulatingfilm layer, and the first gate connection line is located at a positionof the thin film transistor connected to the first gate line.

In other exemplary embodiments, the above manufacturing method mayfurther comprise: after the second gate line is formed on the insulatingfilm layer, forming, on the second gate line, a gate insulating layer,an active layer, a data line, a drain, a common electrode, a firstelectrode layer, a passivation layer, and a second electrode layer.

In conjunction with FIGS. 2, 3 and 4, the gate insulating layer 19, theactive layer 20, the data line 13, the drain 14, the common electrode15, the first electrode layer 21, the passivation layer 18, and thesecond electrode layer 22 are formed on the second gate line 12.

In embodiments of the present disclosure, a plurality of gate linegroups and a plurality of data lines are disposed on a substrate, eachgate line group includes a first gate line and a second gate lineinsulated from each other, and orthographic projections of the firstgate lines and the second gate line on the substrate at least partiallyoverlap. By arranging the two gate lines in the array substrate in astacked manner, width of each gate line group as viewed from a topsurface of the array substrate can be greatly reduced, therebyeffectively reducing the area occupied by the gate lines, increasing theaperture ratio of the array substrate, and improving the transmittanceof a display device comprising the array substrate.

It is to be noted that, in the foregoing description of themanufacturing method, it is expressed as a series of action combinationsfor the convenience of description. However, those skilled in the artshould realize that the present disclosure is not limited to thedescribed sequence of actions, as some steps may be performed in othersequences or concurrently according to the present disclosure. Inaddition, those skilled in the art should also realize that theembodiments described in the specification all belong to exemplaryembodiments, and the involved actions and modules are not necessarilyrequired to implement the concept of the present disclosure.

Each embodiment in this specification is described in a progressivemanner, each embodiment focuses on the differences from otherembodiments, and the same or similar parts among the embodiments can bereferred to each other.

Finally, it is to be further noted that, relational terms herein such asfirst, second, etc. are only used to distinguish one entity or operationfrom another entity or operation, and do not necessarily require orimply that these entities or operations have any such actualrelationship or order. Moreover, the terms “comprising”, “including”, orany other variations thereof are intended to cover a non-exclusiveinclusion such that a process, a method, a commodity or an apparatusthat comprises a list of elements includes not only those elements butalso elements not explicitly listed, or further includes elements thatare inherent to the process, the method, the commodity or the apparatus.In the case of no more limitation, the element defined by the sentence“comprising a . . . ” does not exclude the existence of anotheridentical element in the process, the method, the commodity, or theapparatus comprising said element.

The array substrate, the manufacturing method thereof, and the displaydevice provided by the present disclosure have been described in detailabove. Specific examples are used herein to explain the principle andthe implementation manner of the present disclosure. The aboveembodiments are only used to assist in understanding the method and thecore idea of the present disclosure. At the same time, those ordinarilyskilled in the art will make variations to the specific implementationmanners and the application scope according to the idea of the presentdisclosure. In summary, the contents of the present specification shouldnot be understood as a limitation of the present disclosure.

1. An array substrate comprising a plurality of gate line groups and aplurality of data lines disposed on a substrate, wherein the pluralityof gate line groups intersect with the plurality of data lines to definea plurality of pixel units arranged in an array; wherein each of theplurality of gate line groups includes a first gate line and a secondgate line and the first gate line and the second gate line are insulatedfrom each other; and wherein orthographic projections of the first gateline and the second gate line of each of the plurality of gate linegroups on the substrate at least partially overlap.
 2. The arraysubstrate according to claim 1, wherein each of a plurality of rows ofpixel units in the array includes a plurality of pixel unit groups, eachof the plurality of pixel unit groups includes a first pixel unit and asecond pixel unit, and the first pixel unit and the second pixel unit ofeach of the plurality of pixel unit groups share one data line.
 3. Thearray substrate according to claim 2, wherein in each of the pluralityof pixel unit groups, a thin film transistor of the first pixel unit isconnected to a first gate line in a corresponding gate line group, and athin film transistor of the second pixel unit is connected to a secondgate line in the corresponding gate line group.
 4. The array substrateaccording to claim 3, further comprising an insulating film layerdisposed between the first gate line and the second gate line of each ofthe plurality of gate line groups, wherein the first gate line isdisposed at a side of the insulating film layer close to the substrate;wherein the second gate line is disposed at a side of the insulatingfilm layer away from the substrate, and wherein at a position of thethin film transistor of the first pixel unit, the array substratefurther comprises a first gate connection line disposed in a same layeras the second gate line, the first gate connection line beingelectrically connected to the first gate line.
 5. The array substrateaccording to claim 3, wherein at an intersection of a data line and agate line group, orthographic projections of the first gate line and thesecond gate line in the gate line group on the substrate do not overlap.6. The array substrate according to claim 4, wherein orthographicprojections of the first gate line and the first gate connection line onthe substrate completely overlap.
 7. The array substrate according toclaim 5, wherein in an area of the array substrate other than theintersection of the data line and the gate line group, orthographicprojections of the first gate line and the second gate line on thesubstrate completely overlap.
 8. A display device comprising a colorfilm substrate and an array substrate, wherein the array substratecomprises a plurality of gate line groups and a plurality of data linesdisposed on a substrate, the plurality of gate line groups intersectingwith the plurality of data lines to define a plurality of pixel unitsarranged in an array, wherein each of the plurality of gate line groupsincludes a first gate line and a second gate line insulated from eachother, and orthographic projections of the first gate line and thesecond gate line of each of the plurality of gate line groups at leastpartially overlap.
 9. The display device according to claim 8, whereineach of a plurality of rows of pixel units in the array comprises aplurality of pixel unit groups, wherein each of the plurality of pixelunit groups includes a first pixel unit and a second pixel unit, and thefirst pixel unit and the second pixel unit of each of the plurality ofpixel unit groups share one data line.
 10. The display device accordingto claim 9, wherein within each of the plurality of pixel unit groups, athin film transistor of the first pixel unit is connected to a firstgate line in a corresponding gate line group, and a thin film transistorof the second pixel unit is connected to a second gate line in thecorresponding gate line group.
 11. The display device according to claim10, wherein the array substrate further comprises an insulating filmlayer disposed between the first gate line and the second gate line ofeach of the plurality of gate line groups, wherein the first gate lineis disposed at a side of the insulating film layer close to thesubstrate, wherein the second gate line is disposed at a side of theinsulating to film layer away from the substrate, and wherein at aposition of the thin film transistor of the first pixel unit, the arraysubstrate further comprises a first gate connection line disposed in asame layer as the second gate line, the first gate connection line beingelectrically connected to the first gate line.
 12. The display deviceaccording to claim 8, wherein at an intersection of a data line and agate line group, orthographic projections of the first gate line and thesecond gate line in the gate line group on the substrate do not overlap.13. The display device according to claim 11, wherein orthographicprojections of the first gate line and the first gate connection line onthe substrate completely overlap.
 14. The display device according toclaim 12, wherein in an area of the array substrate other than anintersection of the data line and the gate line group, orthographicprojections of the first gate line and the second gate line on thesubstrate completely overlap.
 15. A manufacturing method of an arraysubstrate, comprising: forming a plurality of gate line groups and aplurality of data lines on a substrate, the plurality of gate linegroups intersecting with the plurality of data lines to define aplurality of pixel units arranged in an array, wherein forming each ofthe plurality of gate line groups comprises: forming a first gate lineon the substrate; forming an insulating film layer on an exposed portionof the substrate and the first gate line; and forming a second gate lineon the insulating film layer, wherein orthographic projections of thefirst gate line and the second gate line on the substrate at leastpartially overlap.
 16. The manufacturing method according to claim 15,wherein the step of forming a second gate line on the insulating filmlayer comprises: forming a via hole in the insulating film layer; andforming the second gate line and a first gate connection line in a samelayer on the insulating film layer, wherein the first gate line iselectrically connected to the first gate connection line through the viahole, and the first gate connection line is located at a position of athin film transistor connected to the first gate line.
 17. Themanufacturing method according to claim 16, wherein at an intersectionof a data line and a gate line group, orthographic projections of thefirst gate line and the second gate line in the gate line group on thesubstrate do not overlap.
 18. The manufacturing method according toclaim 16, wherein orthographic projections of the first gate line andthe first gate connection line on the substrate completely overlap. 19.The manufacturing method according to claim 18, wherein in an area ofthe array substrate other than the intersection of the data line and thegate line group, orthographic projections of the first gate line and thesecond gate line on the substrate completely overlap.
 20. Themanufacturing method according to claim 15, wherein after the step offorming a second gate line on the insulating film layer, themanufacturing method further comprises: forming a gate insulating layer,an active layer, a data line, a drain, a common electrode, a firstelectrode layer, a passivation layer, and a second electrode layer onthe second gate line.